期刊文献+

聚焦偏转复合系统像差分析及应用 被引量:3

Analysis on Aberrations of Superimposed Focus and Deflection System and Its Application
下载PDF
导出
摘要 介绍了以DX - 3扫描电镜为基础 ,利用SDS - 2电子束扫描系统改装其偏转系统。并给出了磁聚焦和静电的偏转场相复合情况下竖轴点源的三级几何像差系数和一级色差系数公式。应用中表明 ,复合系统结构简单紧凑 。 The application of SDS 2 E beam scanning system in DX 3 SEM is introduced. The deflection system of DX 3 has been rebuilt with SDS 2 system. Given are the formulas of the first order chromatic and the third order geomatric aberration coefficients in the superimposition of both magnetic focus and static deflection field for the point source on the z axis. The application shows that the superimposed system has simple construction, small aberration and no need for the aberration to be corrected dynamically.
作者 尹明 张玉林
出处 《微细加工技术》 2002年第4期7-10,共4页 Microfabrication Technology
关键词 像差 电子束 偏转系统 扫描电镜 SEM 磁聚焦 aberration E beam deflection system SEM
  • 相关文献

参考文献3

二级参考文献5

共引文献6

同被引文献19

  • 1干东英,王立鼎.微型机械的现状与发展[J].机械工程学报,1994,30(2):1-8. 被引量:23
  • 2Pfeiffer H C , Stickel W. Projection exposure variable axis immersion lenses: next generation lithography[ J ]. Journal of Vacuum Science and Technology, 1999, B17(11/12) : 2566 - 2578.
  • 3Dewolf P, Brazel E. Electrical testing application for scanning probe microscopes[J]. Solid State Technol,2000, (12) : 117.
  • 4Farrow R C, Liddle J A, Berger S D. Mark detection for alignment and registration in a high-throughput projection electron lithography tool[J]. Journal of Vacuum Science and Technology, 1992, B10(11/12) : 2780- 2786.
  • 5Bakharaen A , Nurgazizon N I. Investigation of selective etching mechanism of nanostructured silica[J]. Surface Science, 2001,482 - 485 : 1319 - 1324.
  • 6Chen W,Ahmed H.Fabrication of sub—10nm structures by lift—off and by etching after electron—beam exposure of poly(methylmethacrylate)resist Oil SCdid substrates[J].Journal of Vacuum Science and Technology,1993,B11:2519.
  • 7安德祥 尹明.DSD—2多功能电子束扫描系统[J].电子学报,1987,15(3):27-30.
  • 8Eigler D M, Schweizer E K.Positioning single atoms with a scanning tunneling microscope.Nature, 1990,344:524~526
  • 9Yamagate Y, Mihara S, Nishioki N.A new fabrication mettecd for micro actuators with piezoelectric thin film using precision cutting technique. IEEE MEMS, 1996, 48, 307~311
  • 10Fritz,Baller M K. Translating biomolecular recognition into nanomechanics. Science, 2000, 288:316~322

引证文献3

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部