应用多孔阳极氧化电流-时间曲线比较壁垒膜厚

Comparson of Barrier Film Thickness with the application of the Porous Anodizing Current-Time Curve

在有壁垒膜存在的表面,多孔膜的生长在氧化初期受到延迟阻碍,这一现象在直流恒压多孔阳极氧化电流一时间曲线上反映出来。电流达到稳态氧化的时间愈长,壁垒膜愈厚。文中应用此法判断了0.5MH_3BO_3介质的pH值、温度对壁垒阳极氧化膜厚的影响,并应用记录同一介质环境壁垒恒流阳极氧化的槽压一时间曲线得到验证。

The growth of porous film on the surface existing barrier film is hindered and postponed at the initial stage of anodizing. This phenomenon can be reflected by the current VS. time curves of porous anodizing at constant dc voltage.The longer time the porous anodizing current reaching the steady state, requires, the thicker the barrier film is. In this paper, the effects of pH and temperature on the thickness of barrier film in 0.5M H3BO3bath are assessed by the time for porous anodizing current to reach steady state. It is also verified by recording the voltage vs. time curve of the barrier film anodizing at constant current in the same bath.