摘要
本文综述近年来,随着超大规模集成电路器件和毫微米器件的迅速发展,国外在高斯圆形和可变成形电子束曝光设备的突出进展。
This report summarizes mainly the successful development of scanningelectron-beam lithography systems both on Gaussian round beam systems andvariable shape beam systems that developed at abroad in recent years,withthe purpose for us to meet the challenges of device development trends,likethe ULSI and nanostructure devices.
出处
《电工电能新技术》
CSCD
北大核心
1992年第2期2-9,共8页
Advanced Technology of Electrical Engineering and Energy
