平板显示中MISM多层膜电子发射结构的制作

Progress of MISM multilayer electron emission structure applied in flat panel display

介绍了一种用于场致发射显示的平面多层膜电子发射结构的制作过程 ,采用真空溅射的方法镀制玻璃衬底 Cr-Cu Al2 O3 ZnS Ag结构的平面电子源 ,对其发射性能进行了论述 。

The progress for making flat multilayer electron emission structure applied in field emission display is described. The Cr-Cu/ Al 2O 3/ZnS /Ag films grown on glass substrate by the way of vacuum sputtering, the fabrication technology on electron emission properties are studied, and the optimum technical parameter is obtained.