摘要
通过直流对靶反应溅射和射频反应溅射工艺制备了系列磁性金属Co掺杂TiO2薄膜样品.通过原子力显微镜和磁力显微镜研究掺杂样品的结构,利用振动样品磁强计研究系列样品的磁性能,对比不同反应溅射方法制备薄膜的性质和结构.经研究发现,射频溅射法制备的样品表面致密程度优于直流溅射法,薄膜表面十分光滑,结构致密,饱和磁化强度略强,薄膜磁性的方向各向异性明显.
CoTiO2 films were prepared by DC facing-target magnetron reactive sputtering and RF reactive sputtering method onto glass substrates at room temperature.The influence of the different method on microstructure and magnetic properties of films was investigated in detail.The microstructure and magnetic properties were studied systemically with scanning probe microscope(SPM)and vibrating sample magnetometer(VSM).The results indicate that the films by RF sputtering method showed a homogeneous structure and ferromagnetic properties than the films by DC facing-target magnetron reactive sputtering.
出处
《河北建筑工程学院学报》
CAS
2015年第1期109-112,共4页
Journal of Hebei Institute of Architecture and Civil Engineering
基金
河北省科技厅指导计划项目(13211032)
河北建筑工程学院青年基金(KYQ-201324)
关键词
磁性薄膜
反应溅射
射频溅射
thin films
magnetic properties
reactive sputtering
