含苯乙烯基光敏有机硅预聚物的合成、表征及其感光性

The synthesis,characterization and phtosensitivity of Si containing polyurethane α-methylstyrene oligomer

以亚异丙烯基 -α,α-二甲基异氰酸酯 (TMI)、羟烷基硅油为原料 ,合成了一种有机硅聚氨酯苯乙烯预聚物 (TSE)。探讨了原料结构、催化剂、反应温度对合成反应的影响 ,确定最佳反应条件为 :反应温度低于 80℃ ,反应时间为 8h。通过IR、GPC、紫外光谱及化学分析法对 TSE结构进行了表征。紫外光谱表明 TSE对紫外光具有光敏性 ,其紫外响应峰为2 4 5和 3 3 3 nm。

A novel photosensitive oligomer polydimethylsiloxaneurethane α-methylstyrene(TSE) was synthesized from TMI and hydroxyl-terminated polydimethylsiloxane.The influence of reagents,catalyst and reaction temperature on the reaction was investigated.It shows that the reaction temperature should be kept below 80℃ and the reaction time was 8h.The structure of TSE was characterized by IR,GPC and UV spectra and chemical analysis.UV spectrum shows that TSE has high responsibility to UV ray of 245 and 333 nm.