摘要
Two different pulse cleaning techniques for ultra-high contrast laser systems are comparably analysed in this work.The first pulse cleaning technique is based on noncollinear femtosecond optical-parametric amplification(NOPA)and second-harmonic generation(SHG)processes.The other is based on cross-polarized wave(XPW)generation.With a double chirped pulse amplifier(double-CPA)scheme,although temporal contrast enhancement in a high-intensity femtosecond Ti:sapphire chirped pulse amplification(CPA)laser system can be achieved based on both of the techniques,the two different pulse cleaning techniques still have their own advantages and are suitable for different contrast enhancement requirements of different laser systems.
Two different pulse cleaning techniques for ultra-high contrast laser systems are comparably analysed in this work.The first pulse cleaning technique is based on noncollinear femtosecond optical-parametric amplification(NOPA) and second-harmonic generation(SHG) processes. The other is based on cross-polarized wave(XPW) generation. With a double chirped pulse amplifier(double-CPA) scheme, although temporal contrast enhancement in a high-intensity femtosecond Ti:sapphire chirped pulse amplification(CPA) laser system can be achieved based on both of the techniques,the two different pulse cleaning techniques still have their own advantages and are suitable for different contrast enhancement requirements of different laser systems.
