摘要
Recently, intense research into laser plasma accelerators has achieved great progress in the production of high-energy,high-quality electron beams with Ge V-level energies in a cm-scale plasma. These electron beams open the door for broad applications in fundamental, medical, and industrial sciences. Here we present conceptual designs of an extreme ultraviolet radiation source for next-generation lithography and a laser Compton Gamma-beam source for nuclear physics research on a table-top scale.
Recently, intense research into laser plasma accelerators has achieved great progress in the production of high-energy,high-quality electron beams with Ge V-level energies in a cm-scale plasma. These electron beams open the door for broad applications in fundamental, medical, and industrial sciences. Here we present conceptual designs of an extreme ultraviolet radiation source for next-generation lithography and a laser Compton Gamma-beam source for nuclear physics research on a table-top scale.
基金
supported by the National Natural Science Foundation of China (Project No. 51175324)
supported by IZEST, Ecole Polytechnique, France,Shanghai Jiao Tong University, Institute of Physics, CAS, China
the Center for Relativistic Laser Science, Institute for Basic Science (IBS), Korea
