摘要
采用原子吸收光谱技术,测定金属硅中的杂质铜、锰、镍,研究了干扰及其消除方法。铜、锰、镍检出限分别为0.009,0.008和0.033mg/L,相对标准偏差小于1.5%。加标回收率95.1%~104.1%。方法简便、快速。
The flame atomic absorption spectrometry was applied for the determination of copper,manganese and nickel in silicon,and the interferences of matrix and its eliminating method were studied.The detection limits of copper,manganese and nickel are 0.009,0.008 and 0.033mg/L respectively,The relative standard deviation is less than 1.5%,The recovery of standard addition is 95.1%-104.1%.The proposed method is simple and rapid.
出处
《冶金分析》
CAS
CSCD
北大核心
2002年第6期28-29,16,共3页
Metallurgical Analysis
关键词
原子吸收光谱法
测定
金属硅
铜
锰
镍
flame atomic absorption spectrometry,copper,manganese,nickel,silicon metal