摘要
利用磁控溅射法 ,在不同的工艺条件下制备氮化钛薄膜。详细分析了不同工艺条件下薄膜的光谱选择特性以及相应的光学常数 ,通过俄歇电子能谱对薄膜的不同深度的元素成分进行了分析 ,由原子力显微镜测量并处理得到氮化钛薄膜的表面形貌图。结果表明 ,氮化钛薄膜的光学性能严格依赖于氮和钛原子数比 ,符合化学计量比的TiN薄膜具有良好的光谱选择性。基底加负偏压溅射可进一步改善薄膜的性能。
TiN films were prepared with different process parameters by magnetron sputtering apparatus. The optical properties and optical constants were investigated in detail. The depth compositional profile and surface morphology were studied by Auger electron spectroscope and atomic force microscope. The results indicated that the optical properties strongly depend on chemical proportion of titanium and nitride in TiN film. It is confirmed that the stoichiometric TiN films have good spectral solar selectivity. Furthermore, sputtering process using the substrate applied with negative bias voltage can improve the properties of TiN films.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2003年第1期101-104,共4页
Acta Optica Sinica
