摘要
本文以氢气和丙酮为原料 ,采用电子增强热丝CVD法 ,在硅片 (10 0 )基体上沉积一层金刚石薄膜 ,并采用光刻法和湿式各向异性刻蚀技术制备出金刚石薄膜自支撑窗口试样。实验结果表明 ,所制备的金刚石薄膜自支撑窗口刻蚀彻底 ,形状规则 ,能够很好地满足鼓泡法的实验要求 ,对CVD金刚石薄膜力学性能的测量具有重要意义。
Diamond thin film is deposited on silicon slice (100), using hydrogen and acetone as gas resource, by means of electron-enhanced hot filament chemical vapor deposition (HFCVD). Free-standing window sample of diamond thin film was fabricated by means of photolithography and anisotropic wet etching. According to the test results, the window of the sample was etched thoroughly and the window figure of the sample was regular. So, the sample is very suitable for bulge test. It is significant for testing of performance of CVD diamond thin film.
出处
《金刚石与磨料磨具工程》
CAS
2002年第6期3-5,共3页
Diamond & Abrasives Engineering
基金
国家自然科学基金资助项目 (项目编号 5 0 0 0 5 0 13)