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微波等离子体化学气相沉积法低温制备直纳米碳管膜 被引量:11

Synthesis of Straight Carbon Nanotube Films by Microwave Plasma Chemical Vapor Deposition at Low Temperature
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摘要 Among the three main methods for the s ynthesis of carbon nanotubes(CNTs ),chemical vapor deposition(CVD)has received a great deal of attentio n since CNTs can be synthesized at sig nificantly low temperature.Plasma chemical vapor deposition me thods can synthesize CNTs at lower te mperature than thermal CVD.But in th e usual catalytic growth of CNTs by CVD,CNTs are often tangled together and have some defects.These will limit t he property research and potential applications.How to synthesize the str aight CNTs at low temperature become s a challenging issue.In this letter,s traight carbon nanotube(CNT)films were achieved by microwave pla sma chemical vapor deposition(MWPCVD)catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃.It wa s found that,in our experimental condition,the uniform growth rate along the circumference of round alloy particles plays a very important role in the gro wth of straight CNT films.And because the substrate is conducting,the straight CNT films grown at low temperature ma y have the benefit for property research and offer the possibility to use t hem in the future applications. Among the three main methods for the synthesis of carbon nanotubes (CNTs), chemical vapor deposition (CVD) has received a great deal of attention since CNTs can be synthesized at significantly low temperature. Plasma chemical vapor deposition methods can synthesize CNTs at lower temperature than thermal CVD. But in the usual catalytic growth of CNTs by CVD, CNTs are often tangled together and have some defects. These will limit the property research and potential applications. How to synthesize the straight CNTs at low temperature becomes a challenging issue. In this letter, straight carbon nanotube (CNT) films were achieved by microwave plasma chemical vapor deposition (MWPCVD) catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610degreesC. It was found that, in our experimental condition, the uniform growth rate along the circumference of round alloy particles plays a very important role in the growth of straight CNT films. And because the substrate is conducting, the straight CNT films grown at low temperature may have the benefit for property research and offer the possibility to use them in the future applications.
出处 《无机化学学报》 SCIE CAS CSCD 北大核心 2003年第3期329-332,共4页 Chinese Journal of Inorganic Chemistry
基金 湖北省教育厅重点资助项目(No.2002A20008)。
关键词 直纳米碳管膜 Fe-Co-Ni合金 微波等离子体化学气相沉积法 低温 镍基板 straight carbon nanotube films Fe-Co-Ni alloy microwave plasma chemical vapor deposition low temperature Ni substrate
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