摘要
综述了近十年来DUV抗蚀剂体系的进展 ,特别对DUV区化学增幅抗蚀剂的矩阵树脂、产酸源、阻溶剂作了详细的阐述。并指出 ,通过改进感光高分子的结构与组成 。
This article introduce the DUV resist in past ten years.Especially,the resist componet such as matrix polymer,photo acid generator and dissolution inhibitor are discussed in detail.It points out the structure and component of photopolymer are improved which can obtain good performance of resist.
出处
《信息记录材料》
2003年第1期16-19,共4页
Information Recording Materials
关键词
DUV光致抗蚀剂
矩阵树脂
产酸源
阻溶剂
化学增幅
DUV resist
matrix polymer
photo acid generator
dissolution inhibitor
chemically amplify
