离子注入中碳污染膜的研究(英文)

STUDY ON CARBON CONTAMINATION LAYER OF ION IMPLANTATION PROCESS

本文研究了离子注入过程中样品表面碳污染的来源,以及各种注入因素对碳膜厚度的影响。文中对碳膜沉积对离子注入样品的性能影响也给予了适当的讨论。

The carbon contamination layer of ion implantation has been studied. Some satisfactory results about the structure of carbon layer and its effect on the properties of ion implantation samples are obtained. The mechanism of production of carbon contamination layers during ion implantation process is also discussed.