摘要
采用磁控溅射方法制备了AuNi5 Ni两层复合材料中的AuNi5膜层 ,并对样品进行退火处理。应用金相显微分析、划痕法和SEM ,研究了AuNi5膜层的结构及性能特点。经退火后 ,分析了AuNi5膜层与Ni基体层间的元素互扩散、结合强度及应力与热处理工艺的关系。
The AuNi 5 film structure AuNi 5/Ni was prepared by magnetron sputtering and then was treated by annealing. By metalloscopy, scale adhere test and scanning electron microscope,the structure and properties of the AuNi 5 layer were studied. The influence of annealing on the interdiffusion,joint strength between AuNi 5 film and Ni substrate were discussed. The treatment and state of substrate surface has an important effect on the joint strength between AuNi 5 film and Ni layer.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2003年第1期135-138,共4页
Chinese Journal of Rare Metals
基金
科研院所技术开发研究专项基金项目 (NCSTE 2 0 0 1 JKZX 0 47)
关键词
磁控溅射
热处理
结合强度
互扩散
magnetron sputtering
heat treatment
joint strength
interdiffusion
