用亚稳态氩原子束制作纳米结构

Using metastable argon atomic beam to fabricate nanostructures

纳米结构制作是纳米技术的重要组成部分 ,原子光刻技术是纳米图形制作的一项新方法。对直流高压放电产生的亚稳态氩原子束进行准直减小其发散角 ,亚稳态原子在与之传播方向垂直的激光驻波场中发生淬火并沉积在基底上 ,破坏吸附在基底表面的SAM膜 (self_assembledmonolayers) ,结合刻蚀技术可制作出纳米量级的图形。给出该技术制作纳米图形的基本原理、方案、相关理论及模拟结果。

Fabrication of nanostructures is an important part of nanotechnology,and atom li thography technology is a new nanostructure fabrication method. A me tastable a rgon atomic beam generated by high-voltage discharge is collimated to minimize t he divergence angle of atomic beam.Metastable atoms are quenched when well-c ollimated beam travels through the light standing wave perpendicular to the prop agation direction of the atomic beam,and then deposited onto the substrate. SAM abso rbed on substrate surface is damaged by metastable atoms,and the nanometer-scale structure can be fabricated with etching technologies. The basic principle,expe rimental schemes,correlative theory of this technique and simulation results are given.