期刊文献+

SiC功率金属-半导体场效应管的陷阱效应模型 被引量:2

Trapping effect modeling for SiC power MESFETs
原文传递
导出
摘要 针对 4H SiC射频大功率MESFET ,建立了一个解析的陷阱效应模型 ,该模型采用简化参数描述方法 ,并结合自热效应分析 ,从理论上完善了SiCMESFET大信号直流I V特性的解析模型 ,且避免了数值方法模拟陷阱效应的巨大计算量 . An analytical trapping modle, which utilizes concise parameters to describe the impact of deep level traps in the p-bufftr layer on the output characteristics, is proposed for 4H-SiC RF power MESFET. This model is simple in calculations compared,with normally used 2D numerical model. It also takes into account the self-heating effect that plays an important role in saturated region of I-V characteristics. The description of transconductatice degradation, drain conductance decrease and pinch-off voltage dispersion caused by the traps is easily derived by theoretical analysis. The result shows good agreement between simulations and measurements.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2003年第2期302-306,共5页 Acta Physica Sinica
基金 国防科技预研基金 (批准号 :8 1 7 3 )资助的课题~~
关键词 SIC 碳化硅 陷阱效应模型 金属-半导体场效应晶体管 深能级陷阱 界面态 silicon carbide trapping effect MESFET deep level trap interface state
  • 相关文献

参考文献10

二级参考文献18

  • 1Schwierz F, Roschke M and Liou J J 1998 Material Science Forum264-268 973
  • 2Royet A S, Ouisse T, Cabon B et al 2000 IEEE Trans. Electronics Devices47 2221
  • 3Siriex D, Nobolic O, Barataud D et al 1999 IEEE Trans. Electron Devices46 580
  • 4Huang M W, Goldsman N, Chang C H et al 1998 Journal of Applied Physics 84 2065
  • 5Ruff M, Mitlener H, Helbig R 1994 IEEE Trans. Electron Devices41 1040
  • 6Canfield P C, Lam S C F, Allstot D J 1990 IEEE Journal of Solid-State Circuits25 299
  • 7Neudeck P G 1995 J. Electron. Mater. 24 283
  • 8Lipkin L A and Palmour J W 1996,J. Elec Mater 25 909
  • 9Mclean F B, Tipton C W and Mcgarrity J M 1996, J. Appl. Phys 79 545
  • 10Brown D M et al 1994 IEEE Trans. Elec. Dev.41 618

共引文献21

同被引文献5

  • 1ISE Integrated Systems Engineering.DESSIS 7.0 Reference Manual[K].2001.
  • 2CODREANU C,AVRAM M,OBREJIA V,et al.Interface states and related surface current in SiC junctions[C]// IEEE Int Semi Conf.Sinaia,Romania,2003:297-300.
  • 3CHA H Y,THOMAS C I,KOLEY G,et al.Reduced trapping effects and improved electrical performance in buried-gate 4H-SiC MESFETs[J].IEEE Trans Elec Dev,2003,51 (7):1569-1574.
  • 4CHA H Y,CHOI Y C,THOMPSON R M,et al.Influence of Si3N4 passivation on surface trapping in SiC metal-semiconductor field-effect transistors[J].J of Elec Mat,2004,33 (8):908-911.
  • 5HENRY H G,AUGUSTINE G,DESALVO G C,et al.S-band operation of SiC power MESFET with 20 W (4.4 W/mm) output power and 60% PAE[J].IEEE Trans on Elec Dev,2004,51(6):839-845.

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部