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RAMAN谱研究在退火和镍衬底上金刚石形核中甲烷的影响(英文)

Micro-Raman Study the Effect of CH 4 for Annealing and Diamond Nucleation on Ni Substrate
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摘要 藉助SEM和MICRO RAMAN ,我们研究了在退火和在镍衬底上金刚石形核中甲烷CH4 的影响。CH4 的浓度分别为 0 % ,0 5 % ,1 5 %和 2 5 % ,其中当甲烷浓度为 1 5 %时 ,金刚石在镍衬底上金刚石形核密度为 3× 1 0 8/cm2 ,这个结果高于以前的结果。金刚石膜的质量是好的。 The effect of CH 4 for density and quality of diamond nuclei on nickel substrates are studied by SEM and Micro-Raman in the high-temperature annealing process. If we change the concentration of CH 4:0.5%,1.5% and 2.5%, the quality of diamond nuclei will be improved, in which the 1.5% CH 4 concentration is found to be best fit for diamond to nucleate 3×108/cm2 on nickel substrates. the density of diamond nuclei is higher than the density of nuclei on nickel substrates in previous works and the quality of diamond is good.
出处 《光散射学报》 2002年第4期190-197,共8页 The Journal of Light Scattering
基金 国家自然科学基金资助 (编号 :5 0 0 72 0 45 )
关键词 RAMAN谱 退火 镍衬底 甲烷 金刚石薄膜 成核 CVD 化学气相沉积 Micro-Raman Diamond Nucleation
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参考文献7

  • 1K. Mallika, R.C. Devries, R.Komanduri. On the low pressure transformation of graphite to diarnond in the presence of acatalyst-solvent[J]. Thin Solid Films, 1999,339:19.
  • 2K. Mallika, T. Ramamohan, K. Jagannadham, et al. On the growth of polycrystallinediamond on transition metal by microwave plasma CVD[J]. Philos. Mag. B, 1999,79:593.
  • 3Jong Moo Huh, Duk Yong Yoon. Enhanced nucleation of diamond on Ni by d. c glowdiacharge in HFCVD[J]. Diam. Relat Mater, 2000,9:1475.
  • 4P.C. Yang, W. Zhu, J. T. Glass. Nucleation of oriented diamond films on Nisubstracts[J]. J.Mater. Res. 1993,8:1773.
  • 5S. Rey, J. Hommet, G. Schmerber, et al. Diamond growth on polycrystalline Nisilicides[J],Journal of Crystal Growth,2000,216:225.
  • 6Jian Kang, Changyong Xiao, Yanyun Xiong, et al. Diamond nucleation and growth undervery low pressure eonditions[J ]. Diam. Relat. Mater. 2000,9:1691.
  • 7X. Chen, J. Narayan. Effect of the chemical nature of transition-metal substrateson chemical vapor deposition of diamond[J ]. J. Appl. Phys. 1993,74: 4169.

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