半导体设备微环境控制方法和前景

The Method and Prospect of Microenvironment Control in the Semiconductor Equipment

超大规模、超高集成度集成电路制造过程中环境因素至关重要,特别是随着特征尺寸的不断减小,环境指标越来越苛刻。分析了半导体设备内部微环境控制在产品性能以及生产成本等方面的重要性,介绍了目前我国自主研发的精密半导体设备微环境控制的方法。从微环境定义、洁净度控制以及温度控制等几个方面,概述了半导体设备微环境控制过程中采用的原理和方法、控制的指标、影响因素以及存在的问题等,进而对我国未来半导体设备微环境控制的技术发展需求、前景和相关产业的机遇进行了总结和展望。

In the manufacturing process of ultra-scale and ultra-high integration IC,environmental factors play a very important role. Especially,with the feature size decreases,environmental indices are more and more stringent.The importance of semiconductor equipment microenvironment control in product performance and cost is analyzed.The methods of microenvironment control in the precision semiconductor equipment are introduced. The control principles,methods,indexes,the influence factors and the problems are summarized from the three aspects of micro environment definition,cleanliness control and temperature control. Then,the technology development needs of microenvironment control,development prospects and the opportunities of related industries in our country are summarized and forecast.