摘要
用TEM观察了InAsSb/A1Sb/GaAs的结构,分析了AlSb过渡层在InAsSb材料生长中的作用,观察到AlSb内位错沿AlSb/GaAs界面垂直延伸约0.25μm。
The structure of TnAsSb/AlSb/GaAs has been surveyed by transmission electron microscopy (TRM).We anslyzed the effect of AlSb buffe layer in.growing the InAsSb material.It has been observed that the dislocations in AlSb lie approximately perpendicular to the direction of the interface of AlSb/GaAs and extend about 0.25um.
出处
《功能材料》
EI
CAS
CSCD
1992年第2期95-96,共2页
Journal of Functional Materials