摘要
用射频溅射法制备出了PTC-BaTiO_3薄膜,基片为Al_2O_3和石英玻璃,基片温度为400～500℃,溅射气氛为纯氧气。试验结果表明不经后续热处理薄膜即具有PTC效应。测试了薄膜的阻温特性、化学组成、厚度及沉积方式。
PTC-BaTiO_3 films were prepared onto Al_2O_3 or SiO_2 by rf-Sputter-Depositing at about 400～500℃ and in pure oxygen. It is not mandatory that all films be heat-treated after being Sputtered, Resistance-Temperature characteristics, chemical composition, thickness and deposition pattern of these films were measured.
出处
《功能材料》
EI
CAS
CSCD
1992年第4期221-224,共4页
Journal of Functional Materials
基金
中科院上海冶金所离子束开放研究室资助
