2-重氮-1-萘醌-5-磺酸-聚乙二醇酯的合成及性能研究

Study on the Synthesis and Photosensitive Properties of the o-Naphthoquinon-Diazide-Polyethyleneglycol Sulfonates

本文通过各种分子量范围的聚乙二醇与2-重氮-1-萘醌-5-磺酰氯(简称“215”-磺酰氯)按下式进行反应。式中,n为3～13的整数,作者对合成条件进行了探索。对所得的光敏剂作了波谱分析,并以这些光敏剂分别与线型酚醛树脂(软化点T_S=125～134℃)及溶剂等配制成紫外正性光刻胶,对光刻胶的感光性能进行了研究。结果表明聚乙二醇-300,在30℃下与215～磺酰氯反应3小时,介质的pH=7～8,所得光敏剂用于正性光刻胶,胶的性能优良,感光速度快,分辨力为Iμm。未曝光区域的留膜率可达96～98％。 文献中指出:单用215-磺酰氯作为光敏剂配制的光刻胶成像性差,分辨力不高,若改变磺酸酯基或磺酰胺氨基(即中心基团)的分子结构例如:酚类,胺类或醇类等化合物^([1～5]),则对光刻胶的性能有很大改善。本屋联这一论点提供了实验依据。

The different molecular weights of polyethylene glyeol were brought into reactionwith I--Naphthoquinon--2--diazide--5--chloride (Ⅱ ) to form (Ⅲ) as(Ⅲ) serves as photosensitizer of positive--working U.V. photoresist,from whichphotoresist can be obtained by mixing with certain ratio of novolak resin and solvents. After a series of probes into the reaction conditions of the above mentionedformular, both the photosensitive properties of (Ⅲ) and the characteristic ofphotoresist are studied. The result shows that the function of the obtained photosensitizer as showed in (Ⅲ) is at its best when the polyethyleneglycol with molecular wight 300 reacted with (Ⅱ)at 30℃ in thc medium of pH=7--8 for 3 hours. The photosensitivity of photoresist[prepared from (Ⅲ)] is higher, resolving power is 1μm. and film remaining power is96--98%, therefore (Ⅲ) is a better photosensitizer of U.V. positive photoresist.