溅射功率对玉米蛋白膜基底上制备氧化锌(ZnO)薄膜性质的影响

Effects of sputtering power on properties of zinc oxide (ZnO) thin films prepared on zein film substrate

室温下采用射频磁控溅射方法在蛋白质基底上沉积了氧化锌(ZnO)薄膜,研究了溅射功率对ZnO薄膜表面形貌和光学性能的影响.X射线衍射测试结果表明,所制备的薄膜均为纤锌矿结构,其取向以(0002)面择优生长为主.薄膜的结晶度和表面形貌与溅射功率密切相关,同时,溅射功率对薄膜的微观结构和光学性能有很大的影响.光学吸收测试结果表明,在玉米蛋白基底上制备的ZnO薄膜在380 nm处具有陡峭的吸收边,在不同溅射功率条件下制备的薄膜禁带宽度均在3.26 eV附近.此外,本文还研究了蛋白质基底上制备ZnO薄膜的光致发光谱.

Zinc oxide(ZnO) thin films were deposited on the protein substrate by the radio frequency magnetron sputtering at room temperature.The effects of sputtering power on the structure and optical properties of ZnO thin films were investigated.X-ray diffraction test results show that the prepared films are all wurtzite structures,and their orientation is dominated by(0002) plane growth.The crystallinity and surface morphology of the film are closely related to the sputtering power.At the same time,the sputtering power has a great influence on the microstructure and optical properties of the film.The optical absorption results show that the ZnO film prepared on the zein substrate has a steep absorption edge at 380 nm,and the band gap of the films prepared under different sputtering power conditions is around 3.26 eV.In addition,the photoluminescence spectra of ZnO thin films prepared on protein substrates were also studied.