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金刚石薄膜制备方法与应用的研究现状 被引量:12

Research trends of preparation and application of diamond film
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摘要 金刚石薄膜由于具有良好的耐磨性能以及极高的硬度,其制备与应用受到研究者广泛关注。目前,金刚石的制备方法总体分为两个部分,其一为高温高压法,另一个则为化学气相沉积法。而目前金刚石薄膜所面临的重大问题是镀膜过程中生长速度较慢,不利于批量生产,另一方面薄膜与基板的附着力较差,其摩擦系数在恶劣的工业环境中较大,这些问题亟待研究解决。本文综述了国内外有关金刚石薄膜化学气相沉积法的各种制备方法,重点讨论了采用热丝化学气相沉积法以及微波化学气相沉积法制备金刚石薄膜的研究现状,并论述了金刚石薄膜的应用优势以及未来金刚石薄膜的制备以及应用的方向和前景。 The preparation and application of diamond film have been extensively focused due to its good wear resistance and super higher hardness.In totally,the preparation of diamond film is assigned into two routes,one is high temperature and high pressure,another is chemical vapor deposition.However,the main problems are faced with the disadvantages of lower growth velocity,that is not beneficial to mass production,and bad adhesion force to substrate,as well as greater friction coefficient as used in adverse industry environment.All these problems must be solved in order to extend the application of diamond films.The route from chemical vapor deposition of diamond film at home and abroad is reviewed by author.Especially,the research state of the preparation of diamond film produced through hot wire chemical vapor deposition and micro-wave chemical vapor deposition is put emphasis on this paper,and the application advantages and the direction and prospect of preparation and application of diamond film in future are discussed.
作者 吴玉程 WU Yu-cheng(Key Laboratory of Interface Science and Engineering of Advanced Materials,Taiyuan University of Technology,Taiyuan 030024,China;Joint National-Local Research Center of Nonferrous Metals and Processing Technology,Hefei University of Technology,Hefei 230009,China)
出处 《材料热处理学报》 EI CAS CSCD 北大核心 2019年第5期1-16,共16页 Transactions of Materials and Heat Treatment
基金 国家"双一流"学科建设高校项目(SC17100153) 山西省"1331工程"学科建设项目(SC18100292)
关键词 金刚石薄膜 HFCVD MPCVD DC PLASMA JET CVD 应用 diamond flim HFCVD MPCVD DC Plasma Jet CVD application
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