摘要
本文介绍了参加SEMICON/WEST′91展览会所见到的国外光刻设备——新研制的制造亚微米器件(16Mb)用的半导体设备已面市。特别引人注目的是许多公司已推出它们的新型光刻设备——0.5～0.8μm硅片分布重复光刻机,如ASM公司的PAS-5500型,Ultratech公司的Ultrastep-2000型,GCA公司的XLS-7000系列,Canon公司的FPA-2000il型,Nikon公司的NSR2005G8i/i8A型依靠i线光刻的分步重复光刻机及用于生产64Mb及256Mb DRAM的有效使用准分子激光器深紫外光刻机的市场可望连续增长。
The new lithography equipment-recent developed semiconductorequipment for sub-micron devices (16 Mb), which we saw in SEMICON/WEST′91 Exhibition, are introduced in the paper. The special noticeableequipment are 0.5~0.8μm DSW, such as PAS-5500 of ASM Lithography,Ultrastep-2000 of Ultratech Stepper,XLS-7000 series of GCA, FPA-2000il ofCanon USA,Inc,NSR 2005 G8i/i8A of Nikon Precision.The markets of DSWrelying on i-line lithography and steppers applying to producing 64 Mb and256 Mb DRAM by effectively using excimer laser deep UV would contin-uously grow.
出处
《光电工程》
CAS
CSCD
1992年第3期52-64,共13页
Opto-Electronic Engineering
关键词
展览会
发展
光刻机
Photolithographic systems, Step-and-repeat photoetching machines, Projection photoetching machines, Development.
