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TEA CO_2 LASER-INDUCED INFRARED PHOTOSENSITIZATION OF SF_6-UF_6-CO SYSTEM

TEA CO_2 LASER-INDUCED INFRARED PHOTOSENSITIZATION OF SF_6-UF_6-CO SYSTEM
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摘要 The sensitized dissociation of UF6 by SF6 excited with a CO2 laser has been studied. We have observed the infrared photosensitization of UF6 with SF6 in the presence of H2. But no work has been done in detail on using CO instead of H2 as an F atom scavenger. In this note, we report further results on TEA CO2 laser-induced infrared photosensitization of the SF6-UF6-CO system. The dissociation yield of UF6 dependent on laser frequency, fluence and CO partial pressure is examined.
出处 《Chinese Science Bulletin》 SCIE EI CAS 1984年第12期1633-1636,共4页
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