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A NEW METHOD OF STRUCTURALLY STUDYING MULTILAYER AMORPHOUS SILICON-ELECTRON MICROSCOPY

A NEW METHOD OF STRUCTURALLY STUDYING MULTILAYER AMORPHOUS SILICON-ELECTRON MICROSCOPY
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摘要 Ⅰ. INTRODUCTION Ultrathin film consisting of amorphous hydrogenated silicon (a-Si: H) and silicon nitride (a-SiN_x:H) alternating layers is a kind of two dimensional semiconductors which are interesting in physics. What is more interesting is that while a-Si:H layer is thin enough, an increase in the optical gap can be observed. Moreover, space charge
出处 《Chinese Science Bulletin》 SCIE EI CAS 1986年第17期1217-1219,共3页
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