自模型曲线分辨法校正ICP-AES中谱线重叠干扰——测量误差对结果的影响

CORRECTIONS OF LINES OVERLAP INTERFERENCE IN ICP-AES BY SELF-MODELING CURVE RESOLUTION EFFECT OF MEASUREMENT ERRORS ON RESULTS

本文将自模型曲线分辨方法(SMCR)应用于ICP-AES谱线重叠光谱干扰的校正,并就测量误差对重叠光谱解析结果的影响作了详细的研究和讨论。两谱线的重叠程度越大,随机误差对光谱干扰校正的影响越大。对测量数据作平滑处理。可以减小数据随机误差对结果的影响,但平滑次数增加,将导致光谱图变形,使干扰校正结果产生较大的误差。数据的平滑不能减小光谱偏离加和性的误差。本工作对两条光谱重叠的情况作了讨论,并取得了较好的结果,表明SMCR法是校正ICP-AES中重叠谱线干扰的一种简便、快速的方法。

A method of correcting lines overlap interference in ICP-AES by self-modeling curve resolution (SMCR) is described and the effect of measurement errors on the resolution results is discussed in detail. The closer the distance between two peaks is, the larger effect of random errors on resolution is obtained. The interference of Ho 379.100nm, V 328.939nm on analytical lines La 379.083nm and Yb 328.937nm are studied with simulated and real spectral intensity data. Data smoothing pre-treatment procedure reduces the fluctuation in data. However, the increase of smoothing times may deteriorate the resolution results.