摘要
The technology of He ion implantation for improving the catastrophic optical damage (COD) level of 980nm semiconductor lasers is introduced.After He ion implantation,p-GaAs obtain higher resistivity than before.About 25μm-long current non-injection regions are introduced near both facets,where the injection current is blocked by high resistivity area.The current non-injection regions can reduce carriers inject to facets,and the rate of the non-radiative recombination are reduced.So the COD level is higher than before.The He ion implantation LDs exhibit no COD failure until the rollover occure at a mean maximum power of 440.5mW.Mean COD level of conventional LDs is given as 407.5mW.Compared to conventional LDs,the mean maximum output power level of He ion implantation LDs is improved by 8%.
报道了氦离子注入技术在提高 980nm半导体激光器灾变性光学损伤 (catastrophicopticaldamage,COD)阈值上的应用 .p GaAs材料经氦离子注入后可以获得高的电阻率 .在距离腔面 2 5 μm的区域内进行氦离子注入 ,由此形成腔面附近的电流非注入区 .腔面附近非注入区减少了腔面载流子的注入 ,因此减少了非辐射复合的发生 ,提高了激光器的灾变性光学损伤阈值 .应用氦离子注入形成腔面非注入区的管芯的平均最大功率达到 44 0 5mW ,没有发生COD现象 .而应用常规工艺制作的管芯的平均COD阈值功率为 40 7 5mW .同常规工艺相比 ,应用氦离子注入形成腔面非注入区技术使管芯的最大输出功率提高了 8% .
