波导材料SiO_2的火焰水解生长及表征

Silica Waveguide Material Fabricated by FHD and Its Characterization

采用火焰法水解法在Si衬底上制备了厚度约20μm的波导下包层材料SiO2膜。利用原子力显微镜(AFM)、X射线光电子能谱(XPS)及可变入射角椭圆偏振仪(VASE)对其进行了测试分析,得到了空气中1400℃退火后SiO2的均方根粗糙度为0.184nm,原子比为1∶2.183,在1.55μm处的折射率为1.4564。

SiO2 films about 20 μm were fabricated on Si substrates by flame hydrolysis deposition (FHD) as buffer layer for waveguides. The products annealed to 1400°C were characterized by atomic force microscopy (AFM), X-ray photoelectron spectrum (XPS) and variable angle spectroscopic ellipsometry (VASE). The root-mean-square surface roughness is 0.184 nm, the ratio of Si:O is 1:2.183, and the refractive index at 1.55 μm is 1.4564.