北京正负电子对撞机同步辐射X射线光刻光束线的光学特性

The Optical Characters of Synchrotron Radiation X-ray Lithography Beamline at BEPC

分析了光刻光束线中影响光刻面光强均匀性及有效工作波段的主要因素,并提出了改善光刻面照明质量的方法。最后给出了相应的实验结果。

The uniformity of the light intensity on the lithography plane and the effective spectral range for the designs of the lithography beamline are the important optical features.This paper analysed the main factor which influences the two features above,and put forwarded to improve the methods of illumination on the lithography plane,and finally presented the experimental results correspordingly.