电沉积超薄膜生长的模拟研究

Simulation of fractal growth of ultra-thin films via electrodeposition

利用MonteCarlo模拟的方法对电沉积超薄膜的生长过程进行了研究,综合考虑了电解溶液中总粒子数n、粒子相遇时的反应概率Ps及粒子定向漂移概率Pd等因素,得到了一系列二维薄膜的分形生长图形,计算了相应的分形维数.结果表明,总粒子数n和反应概率Ps共同决定了沉积薄膜的形貌和相应的分形维数及聚集的粒子数N,而定向漂移概率Pd则对薄膜的形态及分形维数影响不大.

By taking into account the influences of the total number of particles n in the solution, the probability of reaction P\-s and the probability of directional excursion P\-d, the fractal growth of ultrathin films via electrodeposition was simulated by means of Monte Carlo method. The varied patterns of deposition and their fractal dimension were obtained under condition of nearestneighbor. The results showed that the deposition morphologies and their fractal dimensions are determined by n and P\-s. The fractal dimension changes little with the increase of P\-d .