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二维胶体晶体刻蚀法及其应用 被引量:2

TWO\|DIMENSIONAL COLLOID CRYSTAL LITHOGRAPHY AND ITS APPLICATIONS
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摘要 二维胶体晶体刻蚀法合成二维有序纳米颗粒阵列具有操作简单、成本低、易于实现规模化的优点.它可方便地控制纳米颗粒阵列的形态(即颗粒的间距、尺寸、形状甚至成分等),从而实现阵列性质的大范围调制.而二维胶体晶体的合成是这种刻蚀技术的关键,文章着重介绍其形成的基本过程、影响因素及其合成技术;概述胶体晶体刻蚀技术的应用,并对此进行展望. Two\|dimensional(2D)colloid crystal lithography possesses many merits in the synthesis of 2D ordered nanoparticle arrays, such as easy operation, low cost and high output. It can conveniently control the morphology of the arrays, including size, shape, spacing and even composition of the nanoparticles, and thus can realize tunability of the arrays properties over a large region. In this method, the synthesis of the 2D colloid crystal is crucial. We review the formation mechanism influence factors and synthesis of such crystals summarize the applications of this lithography technology and future prospects.
出处 《物理》 CAS 北大核心 2003年第3期153-158,共6页 Physics
基金 国家自然科学基金(批准号:50271069)资助项目
关键词 二维胶体晶体刻蚀法 纳米颗粒阵列 纳米材料 纳米结构 合成 two\|dimensional colloid crystal, lithography, nanoparticle array
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同被引文献13

  • 1赵旦谱,吴丹,陈恳.毛细力驱动自组装定位模型[J].清华大学学报(自然科学版),2005,45(11):1480-1483. 被引量:2
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  • 3赵宏,尹福军,郑军伟,许兴友.聚苯乙烯纳米粒子模板的组装[J].化工矿物与加工,2006,35(11):7-8. 被引量:2
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