热丝CVD法生长纳米金刚石薄膜的研究

Synthesis of Nanocrystalline Diamond Films Deposited by Hot Filament CVD

系统地研究了热丝CVD法中反应气体压力对沉积产物金刚石薄膜的形貌和拉曼谱图的影响,提出了热丝CVD生长纳米金刚石薄膜的新工艺,并在50mm硅片上沉积得到高质量的多晶纳米金刚石薄膜。高分辨透射电镜分析表明,薄膜的晶粒尺寸约为10nm,〈111〉晶面间距为0.2086nm,与标准值0.2059nm很接近,晶粒周围由非晶结构包围。紫外激光拉曼光谱有尖锐的金刚石峰和明显的石墨峰。

Effect of the reactive gases pressure on morphology and Raman spectroscopy of diamond films deposited by hot filament chemical vapor deposition (HFCVD) was systematically investigated.A new process was proposed to deposit the nanocrystalline diamond films using HFCVD technique. The results show that the high quality nanocrystalline diamond film can be deposited on a 50mm diameter Si substrate by reducing the reactive gases pressure. The grain size was observed to be approximately 10nm by HRTEM. The lattice spacing d111estimated from{111}planes is 0.2086nm,which is close to the standard value 0.205 9nm. The grain was surrounded by the sp2 carbon structure. Both the sharp diamond peak and obvious graphite peak were revealed by ultraviolet(UV)Raman spectroscopy.