摘要
金刚石薄膜的表面平整是金刚石薄膜应用于光学、电学等领域的关键。采用氧气作气源,研究了微波等离子体工艺参数如微波功率、基台位置、氧气流量对平整金刚石薄膜效果的影响。处理后的样品用SEM、AFM观察表面形貌、测试了表面粗糙度。实验表明微波等离子体工艺参数对金刚石薄膜的表面平整效果有显著影响,并且这些参数是相互关联的。在适宜的条件下,金刚石薄膜的表面粗糙度明显降低,约为处理前的一半。该法可对金刚石薄膜进行原位处理,方便有效。
Smooth diamond film is essential to its applications in optics, electronics and so on. The effects of the processing parameters of the microwave plasma such as the microwave power,the substrate position and the oxygen flow on the polishing result of the diamond film are studied when using the oxygen as the gas source. The morphology and surface roughness of the etched film are examined and tested by SEM and AFM. The experiments show that the processing parameters of microwave plasma have great influence on the film smoothness and they are related to each other. Under the appropriate conditions, the surface roughness of the resulting film reduces by approximately 50% compared with the original film's roughness, This smoothing method could be easily and effectively applied to the treatment of the diamond film in situ.
出处
《微细加工技术》
2003年第1期40-43,56,共5页
Microfabrication Technology
基金
国家自然科学基金资助项目(69876026)
