提高微细图形光刻分辨力的相移滤波技术研究

Study on Phaseshifting Filtering Technique for Improving Photolithographic Resolutoin of Micropatterns

详细研究了提高投影成像光刻分辨力的相移滤波技术的基本理论 ,给出了理论模型 ,进行了模拟计算 .对不同掩模图形设计制作的不同优化滤波器进行光刻对比实验并取得实验结果 .研究表明 ,相移滤波能显著提高部分相干成像系统光刻分辨力和增大焦深 ,同时能提高光能利用率 ,有利于提高光刻生产率 ,是一种有效提高光刻分辨力和焦深的波前工程技术 .

The basic theory of the phaseshifting filtering technique for improving photolithographic resolution of projection imaging is studied in detail. The theoretical model is given and the simulation calculation is carried out. The different optimized filters are made with different mask patterns designs. The contrast photolithographic experiments are carried out and a number of experimental results have been obtained. The research results show that the phaseshifting filtering can significantly improve photolithographic resolution of partially coherent imaging system and enlarge its focal depth. It can improve light utilization ratio and photolithography production rate. It is an effective wavefront engineering technique for improving photolithographic resolution and focal depth.