An a—C：F：H Film with High—Thermal Stability by Electron Cyclotron Resonance Chemical Vapour Deposition at Room Temperature
被引量：1
-
1辛煜,许圣华,宁兆元,陈军,陆新华,项苏留,黄松,杜伟,程珊华.Infrared and Optical Properties of Amorphous Fluorinated Hydrocarbon Films Deposited with the Method of ECR Plasma[J].Plasma Science and Technology,2004,6(3):2337-2341.
-
2刘明海,胡希伟,吴汉明,邬钦崇,俞国扬.Simulation of nonlinear behavior in an electron cyclotron resonance plasma[J].Plasma Science and Technology,2000,2(3):265-271.
-
3黄峰,康健,叶超,杨慎东,程珊华,宁兆元.The Structure and I-V Property of a-C:F Thin Film[J].Plasma Science and Technology,2001,3(5):947-952.
-
4CAI Chang-long DIAO Dong-feng S.Miyake T.Matsumoto.Influence of bias on properties of carbon films deposited by MCECR plasma sputtering method[J].中国有色金属学会会刊：英文版,2004,14(z1):251-254.
-
5顾广瑞,吴宝嘉,金哲,Ito Toshimichi.Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition[J].Chinese Physics B,2008,17(2):716-720. 被引量：2
-
6A.M.HALA,L.OKSUZ,ZHU Ximing.Preliminary Study of a Hybrid Helicon-ECR Plasma Source[J].Plasma Science and Technology,2016,18(8):832-836.
-
7黄卫东,胡敏,詹如娟.Sheath Characteristic in ECR Plasma Nitriding[J].Plasma Science and Technology,2001,3(2):727-732.
-
8杨慎东,宁兆元,黄峰,程珊华,叶超.Relationship Between Thermal Stability and Optical Bandgap of Fluorinated Amorphous Carbon Films[J].Plasma Science and Technology,2001,3(5):941-946.
-
9金雪松,毕晓昉,欧盛荃,宫声凯,徐惠彬.K18/Mo纳米多层材料的力学性能及高温稳定性[J].金属学报,2000,36(1):99-103. 被引量：6
-
10程珊华,康健,叶超,宁兆元.Plasma Deposition of Fluorinated Amorphous Carbon with CHF_3 and C_6H_6 Mixture[J].Plasma Science and Technology,2000,2(6):573-576.
;
