摘要
用Mevva离子源,将Ag离子注入到石英玻璃中形成纳米晶粒。离子注入的能量为90keV,剂量分别为5×1015、1×1016、3×1016、5×1016、1×1017ions/cm2。X光电子能谱(XPS)分析纳米Ag颗粒没有发生化学反应,说明Ag仍以金属态形式存在。光学透射率测试表明,吸收峰的位置在400nm,当剂量大于5×1016ions/cm2时,发现在440nm左右有一伴峰。分析表明400nm的峰来源于表面等离子体共振吸收,而440nm的伴峰是注入离子形成了少数非常大的纳米颗粒以及纳米颗粒之间相互作用引起的。样品退火后,表面等离子体共振吸收峰红移,而伴峰消失。随着退火的温度升高,峰位红移越大,说明纳米颗粒尺寸增大。
Ag ion was implanted into silica glass to form nanocrystals by using metal vapor vacuum arc(Mevva) source with the dose of 5×1015, 1×1016, 3×1016, 5×1016, 1×1017ions/cm2 and the energy of 90 keV. XPS indicates the Ag nanocrystals were not oxidized, and keeps its metal state, Optical transmission spectra show that there is optical absorption bands at 400nm. When the dose is beyond 5×1016 ions/cm2, another peak of 440nm appears. The peak of 400nm is attributed to the surface plasma resonance of Ag nanocrystals, and the other peak of 440nm is caused by the large nanocrystalsand the multipoles interaction. After annealing, the peak attributed by the SPR shifts to red and the other peak disappears. Red-shift of the peak increases with the annealing temperature increasing,which indicates that the size of nanocrystals increases.
出处
《功能材料与器件学报》
CAS
CSCD
2003年第1期21-24,共4页
Journal of Functional Materials and Devices
关键词
离子注入
纳米晶体
光学透射率
ion implantation
nanocrystals
optical transmission rate