1He Q Peter, Wang Jin. Statistics Pattern Analysis:ANew Process Monitoring Framework and its Appli- cation to Semiconductor Batch Processes[J]. AIChE Journal,2011,57 ( 1 ) : 107 - 121.
2Jaeckle C M,MacGregor J F. Product Design Through Multivariate Statistical Analysis of Pdata [ J ]. AIChE Journal,1998,44(5) :1105 - 1118.
3Lane S, Martin E B, Kooijmans R, et al. Perform- ance Monitoring of Amulti-product Semi-batch Process[ J]. Journal of Process Control, 2001,11 (1):1 -11.
4Krzanowski W J. Between-groups Comparisons of Principal Components [J]. Journal of the American Statistical Association, 1979,74 ( 367 ) :703 - 707.
5Johannesmeyer M C, Singhal A, Seborg D E. Pattern Matching in Historical Data [ J ]. AIChE Journal, 2002,48 (9) :2022 - 2038.
6Gunther J C,Baclaski J,Seborg D E,et al. Pattern matching in Batch B Across Multiple Products and Operating Conditions [ J ]. Computers and Chemical Engineering,2009,33 (1) :88 -96.
7Wold S,Kettaneh N,Frid6n H,et al. Modelling andDiagnostics of Batch Processes and Analogous Ki- netic Experiments [J]. Chemometrics and Intelligent Laboratory Systems, 1998,44 ( 1/2 ) :331 - 340.
8Wise Barry M, Gallagher Neal B. A Comparison of Principle Component Analysis, Multiway Principle Component Analysis, Trilinear Decomposition andParallel Factor Analysis for Fault Detection in a Semiconductor Etch Process[ J]. Journal of Chemo- metrics, 1999,13 (3/4) :379 - 396.