摘要
利用脉冲真空电弧离子镀技术在Ti_Ni形状记忆合金上成功地镀制了类金刚石薄膜,测试了膜层的电阻率,进行了Raman散射和扫描电镜(SEM)分析,并对两种工艺方法的优劣进行了比较.
The diamond_like carbon (DLC) films have been deposited on Ti_Ni alloy by pulsed vacuum arc ion source to improve the surface properties of the alloy. The resistance of DLC films has been tested,the films have been analyzed by Raman and SEM. Two techniques of preparation have been compared.
出处
《西安工业学院学报》
2003年第1期61-65,共5页
Journal of Xi'an Institute of Technology