直流电沉积Ni-Al_2O_3纳米阵列体系结构与性能

Structure and Properties of Ni-Al_2O_3 Nanochannel Array System by Direct Current Electro-deposition

用直流电沉积的方法成功地将Ni金属填入了用二次腐蚀方法制备的氧化铝模板纳米级孔洞中,分别用电子显微镜、X射线衍射仪和振动样品磁强计对Ni阵列体系进行结构观察和磁性表征.结果表明,用二次腐蚀方法制得的多孔氧化铝模板的孔洞排布的有序性很高.被组装的Ni呈单晶结构并具有一定的择优取向;Ni-Al2O3阵列体系有明显的垂直磁各向异性,适用于垂直磁记录介质.

Direct current electro-deposition was applied to add Nickel to the nano-scale holes of porous Alumina template prepared by two-step anodic oxidation. The structure and magnetic performance of Ni-Al2O3 array system were investigated by electron microscope, X-Ray and vibration sample magnetometer. The results indicated that the regularity of the holes' arrangement in the porous Alumina membrane by two-step anodic oxidation was obviously better than that by one-step anodic oxidation. Nickel was in single crystal state in the nanochannal array system and had definite crystall selective-orientation. The array had obvious magnetic anisotropy, and was promising for perpendicular magnetic recording medium.