摘要
光学邻近校正 (OPC)系统要求一种精确、快速的方法来预测掩模图形转移到硅圆片的成像结果 .基于 Gabor的“降解为主波”方法 ,一个部分相干成像系统可以用相干成像系统的叠加来近似 ,并用高斯过滤器来模拟光刻胶横向扩散和一些掩模工艺效应 ,由此提出了一种基于卷积核的精确、快速地用于光刻模拟的稀疏空间点光强计算方法 .这种模型的简单性从本质上给计算和分析带来了好处 .
Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's 'reduction to principal waves',a partially coherent imaging system can be represented as a superposition of coherent imaging systems,so an accurate and fast sparse aerial image intensity calculation algorithm for lithography simulation is presented based on convolution kernels,which also include simulating the lateral diffusion and some mask processing effects via Gaussian filter.The simplicity of this model leads to substantial computational and analytical benefits.Efficiency of this method is also shown through simulation results.
基金
国家自然科学基金资助项目 (批准号 :60 1760 15 )~~
关键词
光刻仿真
光学邻近校正
卷积核
半导体
lithography simulation
optical proximity correction
convolution kernels
