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酸增殖剂及其应用

Acid Proliferation and Its Application
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摘要 基于自催化酸解反应的酸增殖是新的提高成像灵敏度的方法。目前发现有实用价值的酸增殖剂绝大多数为磺酸酯类化合物。本文详细介绍了酸增殖机理和酸增殖剂的种类,比较了2-甲基-2-(对甲苯磺酰氧甲基)-3-酮-丁酸叔丁酯、环己二醇二甲苯磺酸酯、三聚羟基丙醛三对甲苯磺酸酯在化学增幅抗蚀剂体系中的应用性能,认为环己二醇二碳酸酯的灵敏度高,更具有实用价值。 Acid proliferation based on self-catalytic acid hydrolysis reaction is a kind of new method to improve imaging sensitivity. At present, most practical developed acid proliferation agents are almost sulfonates compounds. This paper detailed the mechanism of acid proliferation and its classes. A comparison of properties between 2-methyl-2-( p-tolylsulfo-nyl-oxo-methyl)-3-one-t-butyl butyrate, cyclohexadiolyl dimethylbenzene sulfonate and trilactic aldehyde tritosylate applied in chemically amplified photo resist system are made, and it is found out that the cyclohexadiolyl disulfamate has higher sensitivity, so it has great value.
出处 《精细与专用化学品》 CAS 2003年第5期21-23,18,共4页 Fine and Specialty Chemicals
关键词 酸增殖剂 应用 化学增幅抗蚀 磺酸酯 自催化酸解反应 远紫外照相平版 成像灵敏度 acid proliferation, chemically amplified photo resist, sulfonate
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  • 1[1]Hiromitsu Ito, Kunihiro Ichimura. 4-(tert-Butoxyearbonyloxy) benzyl p-toluenesulfonates as acid amplifiers applicable to chemically amplified photoresists. Macromol. Chem. Phys. , 2000 (201):132~138
  • 2[2]Sang-Wook Park, Koji Arimitsu, Sungeun Lee and Kunihiro Ichimura. A Novel Photoresist Based on Polymeric Acid Amplifiers. Chemistry Letters ,2000:1036 ~ t037
  • 3[4]Koji Arimitsu, Kazuaki Kudo and Kunihiro Ichimura. Autocatalytic Fragmentation of Acetoacetate Derivative as Acid Amplifiers to Proliferate Acid Molecules. J. Am. Chem. Soc., 1998(120):37~45
  • 4[5]Sungeun Lee, Koji Arimitsu, Sang-Wook Park, Kunihiro Ichimura.Synthesis and Evaluation of Novel Acid Amplifiers Liberating Fluoroalkanesulfonic Acids. J. Photopolym. Sci. Technol., 2000 (13):215~216

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