摘要
在GaAs(100)的衬底上,采用MBE自组织方法生长了单层层厚分别为2和2.5 ML,的InAs层。通过原子力显微镜(AFM)观察,证实已在InAs层中形成量子点.采用光致发光谱及时间分辨谱对InAs量子点及浸润层开展研究和对比,分析了单层InAs量子点和浸润层中的载流子迁移过程,较好地解释了实验结果.
Single InAs layers (2 and 2.5 ML thick, respectively) were grown on (001) GaAs substrate by molecular-beam epitaxy (MBE). Formation of quantum dots was verified by atomic force microscopy (AFM). We studied and compared InAs quantum dots and wetting layer by photoluminescence and time-resolved spectrum. Migration of carriers among quantum dots and wetting layer were investigated, which explained our results well.
出处
《量子电子学报》
CAS
CSCD
北大核心
2003年第2期208-212,共5页
Chinese Journal of Quantum Electronics