X射线荧光光谱法测定氮化钒铁中铁、钒、硅的含量

XRFS Determination of Iron,Vanadium and Silicon in Ferrovanadium Nitride

应用X射线荧光光谱法测定氮化钒铁中铁、钒和硅的含量。样品需研磨过孔径为0.074mm的样筛(即200号筛),用淀粉或甲基纤维素为粘合剂,将样品细粉压制成样片,样片厚度在3~5mm间。试验表明:上法制得的样片所得荧光强度稳定,测定结果的精密度符合要求。铁、钒、硅3种元素测定值的相对标准偏差(n=10)依次为0.27%,0.23%,1.51%。经验证,本方法的测定结果与化学法测定结果相符。用基体匹配法制作工作曲线,进行定量分析。

XRFS was applied to the determination of iron,vanadium and silicon in ferro-vanadium nitride.It was shown that the sample should be pulverized to pass through sample sieve with bore size of 0.074mm.Sample for XRFS analysis was prepared by pressing the powdered sample into sample pieces having its thickness between 3to 5mm using starch or methyl cellulose as binder.As shown by the testing results,stable fluorescence intensities were obtained with the sample piece thus prepared.Working curves were prepared by the matrix matching method in XRFS determinations.Precision was tested by analyzing a sample for 10determinations,giving values of RSD′s of0.27%(for Fe),0.23%(for V)and 1.51%(for Si).It was proved that the results of the 3elements found by the proposed method checked quite well with the results obtained by methods of chemical analysis.