摘要
对比不同的抛光方法,选择出针对靶材用高纯铪锭较为有效的机械加化学抛光方法,并通过侵蚀来验证效果。结果表明:采用混合化学抛光液(HF+HNO3+H2O+OPS+H2O2),并施以较小的压力,可将靶材用高纯铪的显微组织清晰地显示出来,为后期显微组织分析提供了条件。
The more effective method for mechanical and chemical polishing was chose through the comparison of different polishing methods for hafnium sputtering target,then the effect was validated by erosion.The results showed that polishing with the solution(HF+HNO3+H2O+OPS+H2O2)and the less pressure was the better method of preparation for metallographic examination for hafnium.And it could provide condition for microstructure analysis.
出处
《理化检验（物理分册）》
CAS
2014年第9期655-657,共3页
Physical Testing and Chemical Analysis(Part A:Physical Testing)
关键词
铪
靶材
显微组织
金相制样
hafnium
target
microstructure
sampling for metallographic examination
