退火对直流磁控溅射铬膜附着性的影响

Effect of Annealing on Adhesion of Cr Films Deposited by D.C Magnetron Sputtering

为了利用铬膜改善锆的抗腐蚀性,研究了退火对Zr-2基体上制备的直流磁控溅射铬膜附着性的影响。使用扫描电镜(SEM)观察了界面形貌及锆、铬的界面分布,用X-射线衍射仪(XRD)分析了膜层的组成,用划痕法测定了铬膜的附着性。结果表明:锆/铬界面结合良好,边界可见;与现有文献比较,获得的铬膜附着性好——均超过20N;溅射后退火使Zr-Cr界面更像扩散界面,但X-射线衍射结果未发现有界面反应产物;退火提高铬膜与Zr-2基体的附着性约50%,扩散附着是附着性增加的主要因素。

Authors try to use chromium thin films deposited by D.C magnetron sputtering to improve the corrosion-resistance of zirconium. The effect of annealing on adhesion of the chromium film on Zr-2 sub-strates has been studied. The composition of the chromium film was identified by X-ray diffraction (XRD), the interface of Cr/Zr was studied with scanning electron microscope (SEM), scratch adhesion tests were performed on a WS-97 Automatic Scratch Tester. The XRD inspection confirms that the film consists of pure chromium, no compound or inter-phase was found, but there is sharp preferred orientation in Cr film. The SEM analysis has found that interface of Cr/Zr is well-knit, though there are visible boundary. Scratch tests have demonstrated a good adhesion for the Cr films: bond strength is more than 20N. It is found out that an-nealing could enhance the adhesion of the Cr films to the substrates, which increases by 50% or so. The rea-son why adhesion adds is diffusion.