摘要
综述了脉冲激光沉积 (PLD)薄膜技术的研究现状 ,并按照研究方向将整个研究领域分为三个部分 :PLD法沉积薄膜的机理 ,PLD的工艺研究以及PLD法沉积的主要薄膜材料 ,分别进行了阐述 ,对相关的研究工作提出了建议 。
The latest progress of pulsed laser deposition (PLD) film growth technology was reviewed.The discussion with specific examples is divided into three parts:PLD mechanism,its technical procedures and its applications in growth of thin film materials.The possible modification and potential applications in high tech were also tentatively discussed.
出处
《真空科学与技术》
EI
CAS
CSCD
北大核心
2003年第1期22-26,共5页
Vacuum Science and Technology
关键词
脉冲激光沉积
薄膜
激光激发等离子体
制备
Pulsed laser deposition,Laser induced plasma,Droplet,Particulate
