摘要
采用离子束溅射方法制备了不同名义厚度的非连续Ni金属膜 .用原位的直流电导和交流介电谱方法研究了其活化能与薄膜名义厚度的关系 ;通过原子力显微镜测量了颗粒直径和颗粒间距 ,估算出薄膜的充电能 .比较表明 ,薄膜的活化能和充电能近似相等 ,与薄膜名义厚度的关系也很相近 ,符合Sheng
The structure, DC conductance σ and dielectric coefficient ε″(ω) of discontinued Ni nano-granular films have been studied as a function of Ni nominal thickness. The activation energy was obtained by both temperature dependent DC conductance and dielectric spectrum (DS) measurements, the charging energy was estimated from the grain size and separation, which were measured by AFM. It was found that the activation energy and the charging energy are similar both in the values and the trends vs. Ni nominal thickness, which is in agreement with the assumption of Sheng-Abeles model. These measurements indicate that, unlike the usual temperature measurements, DS technique is another suitable method for studing film transport, especially for exploring the active mechanism.
基金
国家自然科学基金 (5 9972 0 36
10 174 0 73)资助项目
