低气压下XeCl准分子的形成研究

Study on the Formation of XeCl at Low Pressure

本工作利用高频介质阻挡放电对较低气压(70～1330 Pa)Xe/Cl_2混合气体中XeCl准分子的形成过程进行研究。通过探测不同Xe/Cl_2混合气压和不同Xe/Cl_2混合比条件下放电等离子体在285～315nm波长范围的荧光发射谱,得到了XeCl准分子在308nm附近的荧光发射以及荧光强度随气压变化曲线。得出该实验条件下生成XeCl准分子的最佳Xe/Cl_2混合比为4:1。

Low pressure dielectric barrier discharge was used to study the formation of XeCl excimer in a mixture of Xe/Cl-2 in the range of 70-1330 Pa. The fluorescence emission spectra in the range of 285-315 nm at different pressure and ratio of Xe/Cl-2 were measured. The results indicate that near 308 nm the emission intensities of XeCl formed under the experimental conditions varied with different total pressure and ratio of Xe/Cl-2, and the formation efficiency of XeCl excimer reached maximum value at the ratio of 4:1.